NILESH JAYANTBHAI SHUKLA is registered with Ministry of Corporate Affairs (MCA) having DIN/PAN 00077757. NILESH JAYANTBHAI SHUKLA is director/partner/authorized signatory in 11 company or LLP.
DIN status of NILESH JAYANTBHAI SHUKLA is Active. NILESH JAYANTBHAI SHUKLA is not the director of any ACTIVE non-compliant company.DIN of NILESH JAYANTBHAI SHUKLA was allocated on 16-05-2006.
Following is the current and past directorship/partnerships of NILESH JAYANTBHAI SHUKLA, VADODARA MARATHON, PIONEER ELECMECH (INDIA) PRIVATE LIMITED, AMIGO DISPENSING SOLUTIONS PRIVATE LIMITED, SHAYONA TVASIA NETWORK PRIVATE LIMITED, SUVERNA SANKALP FOUNDATION, UNIFIED GROWTH FOUNDATION, TIE VADODARA FORUM, DENTABRUSH PRIVATE LIMITED, GORADIA INNOVATIVE TECHNOLOGIES PRIVATE LIMITED, SNOWDROP BRISTLERS PRIVATE LIMITED, GHI ENGITECH MARK PRIVATE LIMITED
| DIN | 00077757 |
| Director Name | NILESH JAYANTBHAI SHUKLA |
| DIN Status | Active |
| Allocation Date | 16 |
| Director of Active non-compliant company | No |
| DIR-3 KYC Status | Done |
| DSC Status | NA |
| DSC Expiry Date | NA |
| Company | CIN/LLPIN | Designation | Appointment |
|---|---|---|---|
| VADODARA MARATHON | U92412GJ2009NPL058550 | Director | 12 |
| PIONEER ELECMECH (INDIA) PRIVATE LIMITED | U31200GJ1992PTC066725 | Director | 10 |
| AMIGO DISPENSING SOLUTIONS PRIVATE LIMITED | U29252GJ2001PTC040102 | Director | 10 |
| SHAYONA TVASIA NETWORK PRIVATE LIMITED | U74999GJ2018PTC103889 | Director | 5 |
| SUVERNA SANKALP FOUNDATION | U85300GJ2018NPL102130 | Director | 2 |
| UNIFIED GROWTH FOUNDATION | U74120GJ2015NPL083508 | Director | 11 |
| TIE VADODARA FORUM | U85300GJ2021NPL120420 | Director | 19 |
| DENTABRUSH PRIVATE LIMITED | U36941GJ1996PTC030968 | Director | 17 |
| GORADIA INNOVATIVE TECHNOLOGIES PRIVATE LIMITED | U36942GJ1998PTC033618 | Director | 17 |
| SNOWDROP BRISTLERS PRIVATE LIMITED | U36998GJ1997PTC031792 | Director | - |
| GHI ENGITECH MARK PRIVATE LIMITED | U62090GJ2025PTC171278 | Director | 26 |
Disclaimer : This information is best of our knowledge. Some information may or may not be fully accurate